Facilities and Instrumentation
Laboratory for Laser Energetics
 
Facilities:
Laboratory for
Laser Energetics
Center for Optics Manufacturing
 
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The Group does extensive research at LLE in the Materials Laboratory. Located here are a number of optical tables (some vibration isolated), various laser systems, and a class 100 clean room for substrate cleaning, substrate coating, buffing, and liquid crystal device assembly. LLE logo
 
A partial list of equipment under the control of Mr. Kenneth Marshall is given below.
 

Instrument

Description

Abbe Refractometer used in conjunction with various laser and other light sources to measure refractive index, change in refractive index with temperature, or birefringence of glasses, liquids, liquid crystals, and polymers
HP 1100 high performance liquid chromatograph (HPLC) equipped w/ diode array and refractive index detectors for determining purity in low molar mass compounds
HP 5890A Series II/5988A gas chromatograph/mass spectrometer (GC-MS) w/ auxiliary direct insertion probe for determining molecular structure, purity, in low molar mass compounds
Waters GCT Premier gas chromatograph-time of flight mass spectrometer w/ auxiliary direct insertion probe for determining molecular structure, purity, in low molar mass compounds; accurate mass measurements (0.01 Daltons)
Bruker IFS-66 Fourier Transform spectrometer w/ Hyperion 2000 IR microscope acquires high-resolution transmission and reflection spectra ranging from the UV region (200 nm) to the far IR region (50 cm-1). The optical bench is equipped for both step-scan and rapid-scan data collection, and can acquire time-resolved spectra in the nanosecond regime. Interfaced to the IFS-66 optical bench is a Hyperion 2000 IR microscope, which allows both visible observation of samples and collection of IR spectra on the viewed sample area. The computer-controlled microscope stage allows raster-scanning of larger samples to produce IR spectral profile maps of the entire sample area.
Varian Mercury 200 MHz Fourier transform nuclear magnetic resonance (NMR) spectrometer w/ H1, F19, C13, and P31 and variable temperature capability; for determining molecular structure
Perkin-Elmer DSC-7 w/ CCA-7 liquid N2 controlled cooling accessory and UV curing accessory for measuring glass transition, liquid crystal phase transitions, melting points of solids and low molar mass compounds; UV adhesive properties as a function of cure
Mettler FP52 hot stage optical spectroscopy and experiments at elevated temperatures
Perkin Elmer Dymanic Mechanical Analyzer DMA 8000 Young's modulus, tensile yield stress, damping for adhesives and fibers from room temperature to 100K.
Solartron 1260 Impedance/Gain/Phase Analyzer w/1296 2A (4A) sample holder for solids (liquids) dlelectric spectroscopy; measurement of impedance (1 ohm to 100Terra ohms) for calculating resistance, capacitance, conductance and dielectric constants of solids and liquids over a frequency range of from 10 µHz to 32 MHz
Leica DMRX polarizing microscope w/ DC300F digital camera optiical microscopy of materials
Leitz Orthoplan Pol polarizing microscope interfaced to a Mettler FP-800HT hot stage conoscopy; w/ low temperature cooling accessory for studies of material phases in polarized light
Leitz Metalloplan microscope w/ Nomarski characterization of materials
Perkin-Elmer Lambda 900 UV-VIS-NIR spectrophotometer spectral characterization on small samples and large devices from 200-3200 nm
HP 8453E diode array spectrometer spectral characterization from 200-1100 nm
The following additional equipment is located
in a lab shared with Prof. S. H. Chen.
Agilent 1100/Viscotek Size exclusion chromatograph w/ diode array, refractive index, viscosity, and light scattering detectors molecular weight distribution in polymers
PTI Spectrofluorimeter measures fluorescence for solids, liquids, and devices
 
LLE logo
The Optical Materials Group conducts advanced development work in several laboratories under the control of Dr. Jacobs. These consist of a metrology lab for routine measurements of macroscopic and microscopic surface topography, a nanometrology lab to study issues as diverse as mechanisms of material removal and laser-induced damage, a magnetorheological finishing (MRF) lab for process science research on polishing, and a MLD diffractve optics cleaning lab for acid and plasma cleaning of delicate surfaces.

These laboratories house the instrumentation described below.

 

Instrument

Description

MRF spot-taking machine Magnetorhological finishing machine for studying the polishing of glasses and crystals through the generation of removal spots
Arizona Instruments Computrac MAX1000 moisture analyzer Measures water content of aqueous slurries
Colloidal Dynamics Acoustosizer IIs Measures particle size distributions from 0.01µm to 10µm for concentrated suspensions; also measures zeta potential (particle charge) as a function of pH

Anne Marino Himes (right- BA Math  U of R '05, MS Industrial Math RIT '07) and Jessica DeGroote Nelson (left-BS Optics '02, MS Optics '04, PhD Optics '07,  currently at Optimax SI) using the Acoustosizer II for particle size analysis.  

Brookfield DVIII Programmable Rheometer Measures viscosity of fluid as a function of shear rate
Taylor Hobson Series 2 Form Talysurf PGI System Contact profilometer for precision form measurement to 16 nm resolution on parts up to 120 mm in diameter and with sag up to 28 mm
Zygo GPI xp phase measuring interferometer Global surface shape of 100 mm dia. smooth flats or spherical surfaces to nm precision
Taylor Hobson Talysurf CCI 3000 non-contact 3D surface profiler (new 9/04) microroughness and step height measurement with 0.01nm vertical resolution and 0.36 nm lateral resolution
Zygo New View 5000 3D imaging surface structure analyzer Microroughness from 100 µm down to 3 Å over 0.25 x 0.35 mm area with 1 µm lateral resolution
Digital Instruments Nanoscope III Atomic Force Microscope (AFM) Surface topography maps with atomic scale lateral resolution; equipped to perform contact AFM, tapping mode AFM, non-contact AFM, lateral force microscopy (LFM), phase imaging, and nanoindentation at very low loads (Hystron Triboscope)
NanoInstruments Nano -indenter II, version 2.2 Hardness and near surface properties of solids at low loads ~1 mN
Tukon Microhardness Tester Moderate (1g load) hardness and fracture toughness
Witec Alpha Scanning Near-field Optical Microscope (SNOM) High resolution surface feature studies using scanning near-field optical microscopy, confocal microscopy, and atomic force microscopy in a single instrument

Exicor® 633-nm Birefringence measurement system from
Hinds International

Measurement of linear retardance in transparent materials; high sensitivity maps fpr flat parts up to 100 x 100mm
Exicor® 355--nm UV Mueller Matrix Polarimeter from
Hinds International
Measurement of optical retardance, optical activity, linear and circular diattenuation in transparent materials; high sensitivity maps fpr flat parts up to 450-mm x 450-mm
Leica Optical and Stereo Microscopes
Model: DC 300F
Bright field/Dark field with Nomarski; objectives 1.5x to 50x; equipped with digital camera and color monitor; electronic transfer of images

Anne Marino Himes
Advanced Glass Industries

A 633-nm birefringence mapper is used to examine stresses in optical components. Shown in the picture is a map of a novel thin film polymer liquid crystal waveplate which is being examined for retardance uniformity across the aperture.

 

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