Facilities and Instrumentation
Laboratory for Laser Energetics & Center for Optics Manufacturing
 
Facilities:
Laboratory for
Laser Energetics
Center for Optics Manufacturing
 
HOME page
 

 

 

 
 
 
 

 

 

 

 

 

 

 

 

 

 

 

to TOP

 
The Group does extensive research at LLE in the Materials Laboratory. Located here are a number of optical tables (some vibration isolated), various laser systems, and a class 100 clean room for substrate cleaning, substrate coating, buffing, and liquid crystal device assembly. LLE logo
 
A partial list of equipment under the control of Mr. Kenneth Marshall is given below.
 

Instrument

Description

Abbe Refractometer used in conjunction with various laser and other light sources to measure refractive index, change in refractive index with temperature, or birefringence of glasses, liquids, liquid crystals, and polymers
HP 1100 high performance liquid chromatograph (HPLC) equipped w/ diode array and refractive index detectors for determining purity in low molar mass compounds
HP 5890A Series II/5988A gas chromatograph/mass spectrometer (GC-MS) w/ auxiliary direct insertion probe for determining molecular structure, purity, in low molar mass compounds
Waters GCT Premier gas chromatograph-time of flight mass spectrometer w/ auxiliary direct insertion probe for determining molecular structure, purity, in low molar mass compounds; accurate mass measurements (0.01 Daltons)
Bruker IFS-66 Fourier Transform spectrometer w/ Hyperion 2000 IR microscope acquires high-resolution transmission and reflection spectra ranging from the UV region (200 nm) to the far IR region (50 cm-1). The optical bench is equipped for both step-scan and rapid-scan data collection, and can acquire time-resolved spectra in the nanosecond regime. Interfaced to the IFS-66 optical bench is a Hyperion 2000 IR microscope, which allows both visible observation of samples and collection of IR spectra on the viewed sample area. The computer-controlled microscope stage allows raster-scanning of larger samples to produce IR spectral profile maps of the entire sample area.
Varian Mercury 200 MHz Fourier transform nuclear magnetic resonance (NMR) spectrometer w/ H1, F19, C13, and P31 and variable temperature capability; for determining molecular structure
Perkin-Elmer DSC-7 w/ CCA-7 liquid N2 controlled cooling accessory for measuring glass transition, liquid crystal phase transitions, melting points of solids and low molar mass compounds
Mettler FP52 hot stage optical spectroscopy and experiments at elevated temperatures
Solartron 1260 Impedance/Gain/Phase Analyzer w/1296 2A (4A) sample holder for solids (liquids) dlelectric spectroscopy; measurement of impedance (1 ohm to 100Terra ohms) for calculating resistance, capacitance, conductance and dielectric constants of solids and liquids over a frequency range of from 10 µHz to 32 MHz
Leica DMRX polarizing microscope w/ DC300F digital camera optiical microscopy of materials
Leitz Orthoplan Pol polarizing microscope interfaced to a Mettler FP-800HT hot stage conoscopy; w/ low temperature cooling accessory for studies of material phases in polarized light
Leitz Metalloplan microscope w/ Nomarski characterization of materials
Perkin-Elmer Lambda 900 UV-VIS-NIR spectrophotometer spectral characterization on small samples and large devices from 200-3200 nm
HP 8453E diode array spectrometer spectral characterization from 200-1100 nm
The following additional equipment is located
in a lab shared with Prof. S. H. Chen.
Agilent 1100/Viscotek Size exclusion chromatograph w/ diode array, refractive index, viscosity, and light scattering detectors molecular weight distribution in polymers
PTI Spectrofluorimeter measures fluorescence for solids, liquids, and devices
 
COM logo
The Center for Optics Manufacturing (COM) conducts advanced development work with industrial and government partners on the design and manufacture of computer numerically controlled (CNC) machines used in the deterministic manufacturing of optics. An extensive metrology facility is located within COM. A computer controlled coordinate measuring machine, stylus profilometers, and several interferometers are used to evaluate in-process parts and finished surfaces for global form accuracy and microroughness.

Nano-metrology instruments, located in a clean room and under the control of Dr. Schmid and Dr. Papernov are used to study issues as diverse as mechanisms of material removal and laser-induced damage.

A facilities instrumentation list is given below.

 

Instrument

Description

OptiPro Systems SX50 and 150 Spherical Generating Machines Deterministic CNC generating of rotationally symmetric, spherical and flat surfaces to a precision of l/2 and a rms surface roughness of 0.2 µm on brittle materials; performs edging and beveling in one machine set-up
Moore Nanotechnology Systems Nanotech® 500FG Freeform Generator Conformal deterministic generator for non-rotationally symmetric parts
QED Technologies Q22-Y MRF machine Magnetorhological finishing machine for studying the polishing of glasses and crystals - rotational and raster scanning capability
Arizona Instruments Computrac MAX1000 moisture analyzer Measures water content of aqueous slurries
Colloidal Dynamics Acoustosizer IIs Measures particle size distributions from 0.01µm to 10µm for concentrated suspensions; also measures zeta potential (particle charge) as a function of pH

Anne Marino (right- BA Math  U of R '05, MS Industrial Math RIT '07) and Jessica DeGroote (left-BS Optics '02, MS Optics '04, PhD Optics '07) using the Acoustosizer II for particle size analysis.  

Brookfield DVIII Programmable Rheometer Measures viscosity of fluid as a function of shear rate
Taylor Hobson Series 2 Form Talysurf PGI System Contact profilometer for precision form measurement to 16 nm resolution on parts up to 120 mm in diameter and with sag up to 28 mm
Zygo GPI xp phase measuring interferometer Global surface shape of 100 mm dia. smooth flats or spherical surfaces to nm precision
Taylor Hobson Talysurf CCI 3000 non-contact 3D surface profiler (new 9/04) microroughness and step height measurement with 0.01nm vertical resolution and 0.36 nm lateral resolution
Zygo New View 5000 3D imaging surface structure analyzer Microroughness from 100 µm down to 3 Å over 0.25 x 0.35 mm area with 1 µm lateral resolution
Starrett PREMIS HGDC 2018-16 direct computer controlled coordinate measuring machine (CMM) Arbitrary surface shapes in a 300 mm x 300 mm x 200 mm envelope to a precision of ~3 µm in three dimensions over the full volume
Digital Instruments Nanoscope III Atomic Force Microscope (AFM) Surface topography maps with atomic scale lateral resolution; equipped to perform contact AFM, tapping mode AFM, non-contact AFM, lateral force microscopy (LFM), phase imaging, and nanoindentation at very low loads (Hystron Triboscope)
NanoInstruments Nano -indenter II, version 2.2 Hardness and near surface properties of solids at low loads ~1 mN
Tukon Microhardness Tester Moderate (1g load) hardness and fracture toughness
Witec Alpha Scanning Near-field Optical Microscope (SNOM) High resolution surface feature studies using scanning near-field optical microscopy, confocal microscopy, and atomic force microscopy in a single instrument

Exicor® (Birefringence measurement system)
Hinds International

System for measuring stress in materials; high sensitivity maps of optical retardance for transparent, flat parts up to 100 x 100mm diameter
Leica Optical Microscope
Model: DC 300F
Bright field/Dark field with Nomarski; objectives 1.5x to 50x; equipped with digital camera and color monitor; electronic transfer of images

Anne Marino
Industrial Math  MS RIT '07

A birefringence mapper is used to examine stresses in optical components. Shown in the picture is a map of a novel thin film polymer liquid crystal waveplate which is being examined for retardance uniformity across the aperture.

 

to TOP
[ Home Page ] [ Team ] [ Research Publications ] [ Facilities & Instrumentation ] [ Research Summaries ] [ Courses ] [ Educational Outreach ]
COM & UofR logo
Please send your comments or suggestions to Webmaster.
This site was last updated January 1, 2008.
URL: http://www.opticsexcellence.org/SJ_TeamSite/index.html
This site is maintained by the Center for Optics Manufacturing.
Facilities Instrumentation Link Education Outreach Link Courses Link Research Summaries Link Facilities Instrumentation Link Research Publications Link Team Link